发明名称 PROJECTION LENS WITH NON- ROUND DIAPHRAGM FOR MICROLITHOGRAPHY
摘要 A projection lens for microlithography comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has an aperture (28) having an edge contour which is extended (28') in a non-round manner according to the inclination of the principal ray (34) and according to the distance (D) between the diaphragm (BL) and the mirror (S2).
申请公布号 WO2004046771(A1) 申请公布日期 2004.06.03
申请号 WO2002EP14620 申请日期 2002.12.20
申请人 CARL ZEISS SMT AG;MANN, HANS-JUERGEN;SINGER, WOLFGANG 发明人 MANN, HANS-JUERGEN;SINGER, WOLFGANG
分类号 G02B5/00;G02B17/06;G03F7/20 主分类号 G02B5/00
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