发明名称 |
PROJECTION LENS WITH NON- ROUND DIAPHRAGM FOR MICROLITHOGRAPHY |
摘要 |
A projection lens for microlithography comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has an aperture (28) having an edge contour which is extended (28') in a non-round manner according to the inclination of the principal ray (34) and according to the distance (D) between the diaphragm (BL) and the mirror (S2). |
申请公布号 |
WO2004046771(A1) |
申请公布日期 |
2004.06.03 |
申请号 |
WO2002EP14620 |
申请日期 |
2002.12.20 |
申请人 |
CARL ZEISS SMT AG;MANN, HANS-JUERGEN;SINGER, WOLFGANG |
发明人 |
MANN, HANS-JUERGEN;SINGER, WOLFGANG |
分类号 |
G02B5/00;G02B17/06;G03F7/20 |
主分类号 |
G02B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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