发明名称 DIAMOND POLISHING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a diamond polishing method which enables polishing of diamond to a mirror finish under a non-contact state without substantially affected by the state of a substrate, such as its material, warping amount, area, or thickness. <P>SOLUTION: This polishing method comprises dropping a liquid coating agent containing a material different from diamond on the surface of a diamond, hardening the coating agent to form a coating film having a spherical surface on the diamond, and removing, by dry etching, the coating film and the unevenness on the surface of the diamond under such conditions that both the coating film and the diamond can be etched, thus forming a spherical diamond surface. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004155653(A) 申请公布日期 2004.06.03
申请号 JP20040005987 申请日期 2004.01.13
申请人 SUMITOMO ELECTRIC IND LTD 发明人 FUJII SATORU;HIGAKI KENJIRO;NISHIBAYASHI YOSHIKI;SHIKADA SHINICHI
分类号 C01B31/06;C30B29/04 主分类号 C01B31/06
代理机构 代理人
主权项
地址