METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY AND THIN FILM TRANSISTOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display for reducing the number of photolithography processes. SOLUTION: The liquid crystal display is manufactured in the following steps. They are: a gate electrode and a gate pad comprising layers of a first metal film made of refractory metal and a second metal film made of Al are formed by a first photolithography process; an insulating film is formed on the entire face of the substrate; a semiconductor film pattern is formed on the insulating film in a TFT part by a second photolithography process; and a source electrode and a drain electrode comprising a third metal film are formed in the TFT part by a third photolithography process. Further, the method for manufacturing the liquid crystal display includes steps that: after a protective film is formed on the entire face of the substrate, the protective film and the insulating film are subjected to a fourth photolithography process to form a protective film pattern which exposes the drain electrode in the TFT part and the gate pad in the pad part; the second metal film is etched by using the protective film pattern as a mask to expose the first metal film in the pad part; and a first pixel electrode pattern to be in contact with the drain electrode of the TFT part and a second pixel electrode pattern to be in contact with the first metal film in the pad part are formed by a fifth photolithography process. COPYRIGHT: (C)2004,JPO