| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical antireflection film with a silicon oxide film which ensures adhesion to a synthetic resin substrate, environmental resistance, wear and chemical resistances and has suitable optical characteristics, and to provide a process for forming the same. SOLUTION: A first SiO film having a refractive index substantially equal to the refractive index of an acrylic resin substrate is formed to a thickness of about 200 nm on the substrate, and a second SiO film having a refractive index assuming a value falling within the range from 1.48 to 1.62 is formed to a thickness of about 200 nm on the first SiO film. Further, in the case of an HLHL type antireflection film for example, a TiO<SB>2</SB>film having a refractive index assuming a value falling within the range from 2.2 to 2.4 is formed as the layer next to the outermost layer with a special ion plating apparatus. COPYRIGHT: (C)2004,JPO
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