发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device which can reduce the ground inductance of via holes while preventing decrease in strength and increase in size, and an MMIC (monolithic microwave integrated circuit). SOLUTION: This microwave-band amplifier GaAs MMIC has a ground electrode 8 equipped with a group 12 of three via holes 11. Each of the three via holes 11 has a plated metal portion 10a on its sidewall. The interaction between the plated metal portions 10a, which are close to each other, generates high-frequency electromagnetic field coupling, thereby reducing the ground inductance. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004158865(A) 申请公布日期 2004.06.03
申请号 JP20030425206 申请日期 2003.12.22
申请人 SHARP CORP 发明人 TAKAHASHI SUNAO;MATSUMOTO NOBUYUKI;SHIRAKAWA KAZUHIKO;MOTOCHI YOSHIKI
分类号 H01L21/331;H01L21/3205;H01L21/822;H01L21/8222;H01L23/52;H01L27/04;H01L27/06;H01L29/737;(IPC1-7):H01L21/320 主分类号 H01L21/331
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