ETCHING METHOD AND ETCHING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an etching method for making constant a shape of an etching trench formed by an overetching. SOLUTION: The etching method is used for etching a thin film formed on a substrate with an etchant, and the etching method comprises a step of just-etching the thin film by sensor control, and a step of overetching the thin film just-etched in a predetermined period of time by time control. COPYRIGHT: (C)2004,JPO