| 发明名称 |
Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| 摘要 |
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.
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| 申请公布号 |
US2004103917(A1) |
申请公布日期 |
2004.06.03 |
| 申请号 |
US20030658800 |
申请日期 |
2003.09.10 |
| 申请人 |
ASMIL NETHERLANDS B.V. |
发明人 |
HEERENS GERT-JAN |
| 分类号 |
B08B7/00;G03F1/00;G03F7/20;G03F7/32;H01L21/027;(IPC1-7):B08B7/00;B08B7/02 |
主分类号 |
B08B7/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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