| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflection reduction projection optical system with a superior imaging performance. SOLUTION: The projection optical system projects a reticle pattern with reduction using EUV (extreme ultraviolet) light (with wavelength of 200 nm or shorter). The projection optical system is provided with six mirrors which are arranged so as to fundamentally form a coaxis system, sequentially reflecting the light from the object side toward the image side. The curvature of the radius of each of the six mirrors is 1,500 mm or smaller. COPYRIGHT: (C)2004,JPO |
