| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask, an aligner and an exposure method in which patterns can be transcribed by double exposure with strength of a pattern forming portion reinforced by a reinforcing beam. <P>SOLUTION: There are provided the pattern forming portions 12a, 12b with patterns through which electron beams pass to perform transcription onto a wafer, and the reinforcing beams 11 for partitioning the pattern forming portions 12a, 12b and reinforcing the strength of the pattern forming portions 12a, 12b. The reinforcing beams 11 are arranged corresponding to scribe lines 21 for dividing the wafer into each of chips 22. <P>COPYRIGHT: (C)2004,JPO</p> |
