| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition device in which vapor deposition of high precision can be carried out by reducing the influence of radiant heat from a crucible of evaporation source on the vapor deposition mask and by suppressing the swelling of the vapor deposition mask. SOLUTION: This is the vapor deposition device to cover a glass substrate for a vapor deposition object by an evaporated material M via the vapor deposition mask 3, and this device is provided with a radiation preventing means composed of the crucible 21 to house the evaporated material M, and a metal plating 23 which is installed in adhered state to the face facing at least the glass substrate 1 of this crucible 21, and which is constituted of the material of lower heat radiation efficiency than the material of the crucible 21. COPYRIGHT: (C)2004,JPO
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