| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To conduct inspection under optimum conditions without delay of inspection time by obtaining an optimal irradiation condition of an electron beam according to the material and structure of a circuit pattern to be inspected and kinds of defects to be detected. <P>SOLUTION: An optimal value of irradiation energy according to the structure of a sample is registered with a database within the apparatus in advance. A user is allowed to search for a recommended value of irradiation energy suitable for inspection by inputting or selecting irradiation energy, or inputting information on the structure of an object to be inspected. By using the inspecting method, a substrate having a circuit pattern is inspected, while an image of a location in which a defect is detected is automatically stored. By using the stored image, defects are classified simultaneously with or separately from the inspection. <P>COPYRIGHT: (C)2004,JPO</p> |
