发明名称 Method for manufacturing very low roughness electrodeposited copper foil and electrodeposited copper foil manufactured thereby
摘要 The present invention relates to a method for manufacturing a low roughness electrodeposited copper foil, and an electrodeposited copper foil manufactured thereby, and uses an electrolyte which basically consists of a sulfuric acid, a copper ion and a chloride ion is adapted with an additive which consists of a HEC (Hydroxyethyl Cellulose) of 0.05~50 ppm, a SPS (bis(sodiumsulfopropyl)disulfide) of 0.05~20 ppm, and a gelatin of 0.1~100 ppm. The present invention is adapted to manufacture a low roughness electrodeposited copper foil using a conventional copper foil manufacture facility and the electrodeposited copper foil according to the present invention is adapted as a material for a copper clad laminate for a printed circuit substrate and an electrode material for a lithium ion battery.
申请公布号 US2004104118(A1) 申请公布日期 2004.06.03
申请号 US20030720579 申请日期 2003.11.24
申请人 LG CABLE LTD. 发明人 KIM SANGYUM;CHOI CHANG HEE;JO CHA JAE;KIM JEONG IK;WOO KYUNG NYUNG;KI JOON SEO;MOON HONG GI
分类号 C25D1/04;C25D3/38;H05K1/09;(IPC1-7):C25D3/38 主分类号 C25D1/04
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