发明名称 |
Optical arrangement used in the production of semiconductor components comprises a lens system arranged behind a mask, and a medium having a specified refractive index lying between the mask and the lens system |
摘要 |
Optical arrangement (11) comprises a lens system (14) arranged behind a mask (13), and a medium having a refractive index (n) of more than 1 lying between the mask and the lens system. An Independent claim is also included for an optical lithographic process using the above optical arrangement.
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申请公布号 |
DE10253679(A1) |
申请公布日期 |
2004.06.03 |
申请号 |
DE20021053679 |
申请日期 |
2002.11.18 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
SEBALD, MICHAEL;RICHTER, ERNST CHRISTIAN |
分类号 |
G02B13/24;G03F1/08;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G02B13/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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