发明名称 Optical arrangement used in the production of semiconductor components comprises a lens system arranged behind a mask, and a medium having a specified refractive index lying between the mask and the lens system
摘要 Optical arrangement (11) comprises a lens system (14) arranged behind a mask (13), and a medium having a refractive index (n) of more than 1 lying between the mask and the lens system. An Independent claim is also included for an optical lithographic process using the above optical arrangement.
申请公布号 DE10253679(A1) 申请公布日期 2004.06.03
申请号 DE20021053679 申请日期 2002.11.18
申请人 INFINEON TECHNOLOGIES AG 发明人 SEBALD, MICHAEL;RICHTER, ERNST CHRISTIAN
分类号 G02B13/24;G03F1/08;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 主分类号 G02B13/24
代理机构 代理人
主权项
地址