| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To realize a flatness simulation system for a mask substrate effective for solving the problem of lowering in the yield of products due to degradation in the flatness of the mask substrate by chucking the mask substrate to a mask stage of a water exposing device. <P>SOLUTION: The flatness simulation system for mask substrate is characterized by being provided with a means for measuring the flatness of the substrate to acquire first information on the flatness of a major face of the mask substrate and a means for acquiring second information on the flatness of the major face by the simulation when the mask substrate is set at the exposing device from the first information and the information on the mask chuck structure of the exposing device. <P>COPYRIGHT: (C)2004,JPO</p> |
