发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus wherein first the turbulent flow or the stagnation of liquid is prevented and treatment is unified without dispersion, whereby the accuracy of a printed wiring substrate is improved, while secondly the generation of a trouble of a circuit such as damage or the like is prevented and a defective in the printed wiring substrate is reduced, whereby an yield is improved. SOLUTION: The substrate treatment device 5 is employed in the manufacturing process of the printed wiring substrate. In this case, treatment liquid S is injected from spray nozzles 4, and regulating liquid E is sprayed from fore-and-rear regulating liquid spraying units 6 while transferring the printed wiring substrate P by a conveyer 2 in a no contact state with the front surface Q or the rear surface F of a circuit forming surface R. According to this method, regulating liquid zones are formed on the circuit forming surface R along the direction of left-and-right width W, and the treatment liquid S is regulated while being pinched between the regulating liquid zones, whereby the liquid effects predetermined treatment during flowing in forming a flow passage along the direction of left-and-right width W, and thereafter, the liquid flows down from both right and left sides of the circuit-forming apparatus. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004158765(A) 申请公布日期 2004.06.03
申请号 JP20020325078 申请日期 2002.11.08
申请人 TOKYO KAKOKI KK 发明人 NIIYAMA KISABURO;HARA CHIKARA
分类号 C25F7/00;B05B5/00;H05K3/00;H05K3/06;H05K3/26;(IPC1-7):H05K3/06 主分类号 C25F7/00
代理机构 代理人
主权项
地址