| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus that can form a Ti film to stabilize the orientation of the films, and to provide a method for manufacturing a semiconductor device. SOLUTION: The semiconductor apparatus is provided with a chamber 50 for titanium sputtering, a cold trap 58 that is communicated with the chamber 50 to absorb the water vapor in the chamber 50, a quadrupole mass spectrometer (water vapor quantity monitoring part) 62 that monitors the quantity of the water vapor in the chamber 50 and outputs a monitor signal of the quantity of the water vapor, and a control unit 63 for controlling the temperature of the cold trap 58. The control unit 63 changes a set temperature of the cold trap 58 according to the monitor signal so that the value of the monitor signal may be within a specified range. COPYRIGHT: (C)2004,JPO
|
