发明名称 |
Method to enhance resolution of a chemically amplified photoresist |
摘要 |
A method to enhance resolution of a chemically amplified photoresist generally includes forming a relief image in the chemically amplified photoresist, wherein the relief image comprises a feature having a first dimension; and contacting the relief image with an aqueous acidic solution for a period of time effective to reduce first dimension of the relief image to a second dimension.
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申请公布号 |
US2004106070(A1) |
申请公布日期 |
2004.06.03 |
申请号 |
US20020309404 |
申请日期 |
2002.12.03 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LI WAIKIN;WU CHUNG-HSI |
分类号 |
G03F7/004;G03F7/40;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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