MICROSTRUCTURE COMPRISING A SURFACE WHICH IS FUNCTIONALISED THROUGH THE LOCALISED DEPOSIT OF A THIN LAYER AND PRODUCTION METHOD THEREOF

摘要

The invention relates to an electromechanical microstructure (1) consisting of a first mechanical part (102) which is made from a first conductive material and which comprises (i) an elastically-deformable area (104) having a given thickness value and an exposed surface (2) and (ii) a first organic film (4) having a given thickness, which is disposed over the entire exposed surface (2) of the aforementioned deformable area (104). The invention is characterised in that (a) the thickness of the first film (4) is such that the elastic response of the deformable area (104) comprising the first film (4) does not change by more than 5 % in relation to the response of the bare deformable area (104) or (b) in that the thickness of the first film (4) is ten times smaller than the thickness of the deformable area (104). The invention is suitable for the production of electromechanical microstructures.