| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent errors with respect to reticle information and also to provide a reticle manufacturing method to ease working. <P>SOLUTION: The reticle manufacturing method for use in a photolithography process includes (1) a stage for constructing a database sorting components including each coordinate, area and condition of the process execution in each pattern image of each product into each product group, by selecting a process mark corresponding to each product group and substituting an area range of a scribe line in the database (a ST 204), and for substituting each component of the pattern image to select the process mark and extract the area range of the scribe line (a ST 206-210); (2) a stage for setting a reference coordinate combining the component of the pattern image and area range of the scribe line (a ST 212); and (3) a stage for designing and forming the process mark by associating the coordinate of the selected process mark with each pattern image en bloc, based on the reference coordinate (a ST 214). <P>COPYRIGHT: (C)2004,JPO |
