发明名称 POLISHING DEVICE AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing device and a method that a top ring body can follow smoothly and rapidly a movement (tilting motion) of an upper surface of a turntable and that a turning torque of a top ring driving shaft can be transferred firmly to the top ring body. <P>SOLUTION: The polishing device has a turntable 20 and a top ring body 3, polishes a surface of a polishing object 6 to be a flat and mirror-like surface by putting the polishing object 6 pressed with a specified force and slid between the turntable 20 and the top ring body 3, and is equipped with a surface pressure adjusting means 37 for adjusting surface pressure distribution of a lower surface of the top ring body 3. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004154936(A) 申请公布日期 2004.06.03
申请号 JP20040025817 申请日期 2004.02.02
申请人 EBARA CORP 发明人 HIROSE MASAYOSHI;TSUJIMURA MANABU;ISHIKAWA SEIJI;KIMURA NORIO;ISHII YU
分类号 B24B37/005;B24B37/30;H01L21/304 主分类号 B24B37/005
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