| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask for a semiconductor device and an exposure method by which a defective chip or a defocus state can be prevented. <P>SOLUTION: Shot region layout is carried out so as to project mask regions where proper numbers of device patterns are arranged onto the center part and the peripheral part of a wafer, which is exposed while shielding the region not to be projected against light. A mask having a center region 101, where a plurality of device patterns 2 are arranged each in rows and columns and a plurality of peripheral regions 102 to 109 which are outside of the center region 101 and arranged as separated by light-shielding stripes, is used to layout the shot regions by projecting an appropriate region onto the center part and the peripheral part of the wafer and to expose. <P>COPYRIGHT: (C)2004,JPO</p> |
