| 摘要 |
PROBLEM TO BE SOLVED: To obtain a scanning aligner in which unevenness of illuminance is measured with high accuracy by lessening sensitivity variation incident to temperature variation of a photoelectric sensor for measurement (uneven illuminance sensor) mounted on a wafer stage. SOLUTION: In the measurement of unevenness of illuminance on an exposure field, an uneven illuminance sensor is waited outside the irradiation region of illumination light when the sensor is moved stepwise in the direction of slit (non-scanning direction) so that the illumination light is not measured entirely but measured by the uneven illuminance sensor at a constant time interval. Since the quantity of incident light per unit time is reduced, temperature rise of the uneven illuminance sensor is suppressed. COPYRIGHT: (C)2004,JPO
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