| 发明名称 |
COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS SUCH AS FILMS INCLUDING SILICON, SILICON NITRIDE, SILICON DIOXIDE AND/OR SILICON-OXYNITRIDE |
| 摘要 |
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| 申请公布号 |
AU2003287710(A1) |
申请公布日期 |
2004.06.03 |
| 申请号 |
AU20030287710 |
申请日期 |
2003.11.12 |
| 申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
ZIYUN WANG;CHONGYING XU;RAVI, K. LAXMAN;THOMAS, H. BAUM;BRYAN HENDRIX;JEFFREY ROEDER |
| 分类号 |
C07F7/02;C07F7/10;C07F7/12;C23C16/30;C23C16/34;C23C16/40;C30B25/02;C30B29/06;H01L21/314;H01L21/316;H01L21/318 |
主分类号 |
C07F7/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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