| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a polymer compound for a photoresist which has not only adhesivity to a substrate, acid elimination properties and dry etching resistance but also excellent balance between solubility in a resist solvent and alkali solubility. <P>SOLUTION: The polymer compound for a photoresist comprises a monomer unit having a 2,6-dioxabicyclo[3.3.0]octane skeleton in the polymer structure. A monomer unit represented by formula (1) (R is a hydrogen atom or a methyl group) is contained in the monomer unit having the 2,6-dioxabicyclo[3.3.0]octane skeleton. The polymer compound for a photoresist may comprise the monomer unit having the 2,6-dioxabicyclo[3.3.0]octane skeleton, a monomer unit having adhesivity to a substrate and a monomer unit having an acid elimination group. <P>COPYRIGHT: (C)2004,JPO |
