| 发明名称 |
GRAPHITE MATERIAL FOR ION IMPLANTING APPARATUS AND GRAPHITE MEMBER FOR ION IMPLANTING APPARATUS USING THE SAME |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a graphite material for an ion implanting apparatus in which an erosion and a particle drop in the case of irradiating with an ion beam are few. SOLUTION: In the graphite material for the ion implanting apparatus, a measured value by an ACT-JP method is 0.2 g/mm<SP>3</SP>or more. COPYRIGHT: (C)2004,JPO
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| 申请公布号 |
JP2004158226(A) |
申请公布日期 |
2004.06.03 |
| 申请号 |
JP20020320699 |
申请日期 |
2002.11.05 |
| 申请人 |
TOYO TANSO KK |
发明人 |
SAITO KIYOSHI;SUZUKI HITOSHI;TOJO JUN;ANDO ATSUKO;TOJO TETSURO |
| 分类号 |
H01J37/317;H01L21/265;(IPC1-7):H01J37/317 |
主分类号 |
H01J37/317 |
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