发明名称 FIELD EFFECT TRANSISTOR STRUCTURE, ASSOCIATED SEMICONDUCTOR STORAGE CELL, AND CORRESPONDING PRODUCTION METHOD
摘要 The invention relates to a field effect transistor structure, an associated semiconductor storage cell, and a corresponding production method. A diode-doping area (4) within a semiconductor substrate (1) is embodied with a field effect transistor structure (S/D, 3, K) while an electrically conducting diode-connecting layer (5) connects a control layer (3) of the field effect transistor structure to the diode-doping area (4) so as to create a diode (D), whereby excess charge carriers (L) in the semiconductor substrate (1) can be eliminated such that an undesired body effect is prevented.
申请公布号 WO2004047182(A2) 申请公布日期 2004.06.03
申请号 WO2003DE03748 申请日期 2003.11.12
申请人 INFINEON TECHNOLOGIES AG;HIERLEMANN, MATTHIAS;STRASSER, RUDOLF 发明人 HIERLEMANN, MATTHIAS;STRASSER, RUDOLF
分类号 H01L21/336;H01L21/8242;H01L27/02;H01L27/102;H01L27/108;H01L29/10;H01L29/78 主分类号 H01L21/336
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