发明名称 |
FIELD EFFECT TRANSISTOR STRUCTURE, ASSOCIATED SEMICONDUCTOR STORAGE CELL, AND CORRESPONDING PRODUCTION METHOD |
摘要 |
The invention relates to a field effect transistor structure, an associated semiconductor storage cell, and a corresponding production method. A diode-doping area (4) within a semiconductor substrate (1) is embodied with a field effect transistor structure (S/D, 3, K) while an electrically conducting diode-connecting layer (5) connects a control layer (3) of the field effect transistor structure to the diode-doping area (4) so as to create a diode (D), whereby excess charge carriers (L) in the semiconductor substrate (1) can be eliminated such that an undesired body effect is prevented. |
申请公布号 |
WO2004047182(A2) |
申请公布日期 |
2004.06.03 |
申请号 |
WO2003DE03748 |
申请日期 |
2003.11.12 |
申请人 |
INFINEON TECHNOLOGIES AG;HIERLEMANN, MATTHIAS;STRASSER, RUDOLF |
发明人 |
HIERLEMANN, MATTHIAS;STRASSER, RUDOLF |
分类号 |
H01L21/336;H01L21/8242;H01L27/02;H01L27/102;H01L27/108;H01L29/10;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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