| 摘要 |
The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) <CHEM> (R<1> and R<2> are aromatic rings, and R<3> represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R<1> to R<3> may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) <CHEM> (R<4> to R<6> are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R<4> to R<6> is an aromatic ring with an electron-donating group. R<4> to R<6> may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out. |
