发明名称 ATMOSPHERIC PLASMA GENERATOR
摘要 PURPOSE: An atmospheric plasma generator is provided to reduce damage of a processing target and form the high-density plasma by preventing the generation of arc between a high-voltage electrode and the processing target. CONSTITUTION: An atmospheric plasma generator includes a high-voltage electrode(120), a ground electrode(110), and a dielectric(125) inserted between the high-voltage electrode and the ground electrode. A gas is injected into a plasma generation region(125a) formed between the high-voltage electrode and the ground electrode. The dielectric is formed with a shaped of cylinder. The high-voltage electrode is close to an inner circumference of the dielectric. A cylindrical hole(111) is formed in the ground electrode. The dielectric is inserted into the cylindrical hole. The plasma generation region is formed between an inner circumference of the cylindrical hole and an outer circumference of the dielectric. An inflow path(114) and an outflow path(115) are formed at the plasma generation region.
申请公布号 KR20040045661(A) 申请公布日期 2004.06.02
申请号 KR20020073506 申请日期 2002.11.25
申请人 HANMISEMICONDUCTOR CO., LTD. 发明人 PARK, IN GYU
分类号 H05H1/30;(IPC1-7):H05H1/30 主分类号 H05H1/30
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