FLUID DELIVERING SYSTEM AND METHOD, AND CHEMICAL MECHANICAL POLISHING SYSTEM

摘要

PURPOSE: A fluid delivering system and method, and a CMP(Chemical Mechanical Polishing) system are provided to be capable of supplying slurry and a slurry additive to a platen as much as an aiming flow rate. CONSTITUTION: A fluid delivering system is provided with the first flow controller(14) having the first fluid input connected to the first fluid source, the second flow controller(18) having the second fluid input connected to the second fluid source, a controller(22) for controlling the flow rate of the first and second flow controller by generating an output signal, and a variable resistor(30) between the output of the controller and the input of the second flow controller. At this time, the output signal of the controller and the resistance of the variable resistor are controlled for deciding the flow rate of fluid from the first and second flow controller.