发明名称 |
Pre-treatment for salicide process |
摘要 |
A method for treating a silicon substrate is described. The silicon substrate is placed into a sputtering equipment. A sputtering step is performed to simultaneously dry clean and amorphize the silicon substrate surface by using the sputtering equipment. A titanium film is deposited on the silicon substrate by the sputtering equipment.
|
申请公布号 |
US6743485(B2) |
申请公布日期 |
2004.06.01 |
申请号 |
US20020074151 |
申请日期 |
2002.02.11 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
FAN SU-CHEN |
分类号 |
C23C14/02;C23C14/16;(IPC1-7):C23C8/00;C23C14/34;B44C1/22;B05D3/02 |
主分类号 |
C23C14/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|