发明名称 |
Geometric compensation method for charged particle beam irradiation |
摘要 |
A charged particle beam method for irradiating an array of sub-regions within an areal region within a substrate with a series of shots of a charged particle beam provides that a sequencing of irradiation of the array of sub-regions is geometrically determined such as to minimize charged particle beam deflection when irradiating the series of sub-regions with the series of shots of the charged particle beam. Due to the geometric determination which provides the minimized charged particle beam deflection, the charged particle beam method has enhanced accuracy.
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申请公布号 |
US6744058(B1) |
申请公布日期 |
2004.06.01 |
申请号 |
US20020324964 |
申请日期 |
2002.12.20 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
GAU TSAI-SHENG;CHEN LI-JUI |
分类号 |
G03B27/00;H01J37/302;(IPC1-7):H01J37/302;G03F9/00 |
主分类号 |
G03B27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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