| 摘要 |
To provide a method of manufacturing a thin film magnetic head capable of realizing an accurate control of a pole width and a sufficient overwrite characteristic even when the pole width is narrowed. In a connecting portion of an intermediate portion and a tip portion in a top pole, a step face in a width direction of almost the right angle is provided. The step face has a first corner at an intersection portion between the step face and a side face in the tip portion. A positive photoresist is used for a photolithography process to form the top pole. A photomask used at the time of exposure includes a projection in a shape having an acute angle portion in a portion corresponding to the first corner in the top pole. Consequently, a wedge-shaped recess is formed in the first corner in the top pole. Thus, even when the throat height is changed, the recording track width is not changed and the recording track width can be prevented from being widened. The stable overwrite characteristic such that a magnetic flux saturation does not occur can be obtained.
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