POSITIVE RESIST COMPOSITION AND FORMATION METHOD OF PATTERN USING THE COMPOSITION TO INHIBIT GENERATION OF STANDING WAVE AND TO OBTAIN RECTANGULAR PROFILE BY USING SPECIFIC ACID-LABILE RESIN

摘要

PURPOSE: A positive resist composition and a method for forming a pattern by using the composition are provided, to inhibit the generation of a standing wave, to obtain a rectangular profile and to improve the applicability to highly reflective substrate. CONSTITUTION: The positive resist composition comprises a resin which comprises at least one of repeating units represented by the formulas I, II and III and whose solubility to an alkali developer is increased by the action of an acid; a compound which generates an acid by the irradiation of an active ray or a radioactive ray; and a solvent, wherein L and L' are independently H, an alkyl group or an aralkyl group; Z1 is a group having an absorption at 248 nm; W is an alkyl group; and Z1 and L and W and L' can combine together to form a five or six-membered ring.