发明名称
摘要 PROBLEM TO BE SOLVED: To provide a dresser which can manufacture a semiconductor of high quality and yield by removing loading of a polishing cloth and stabilizing a polishing speed. SOLUTION: This dresser is constituted of a protrusion part D exposed with superhard particles and a groove T continued from a central part over to the periphery, in the groove, a protrusion part continued from the central part over to the periphery without superhard particles is provided. The superhard particle is diamond (a) or cubic system boron nitride, or an area of the protrusion part D exposing the superhard particle is larger than an area of a protrusion part F, or a height difference between an exposed part D of the hard particle and the protrusion part F without hard particle is 0.5mm or less.
申请公布号 JP3533046(B2) 申请公布日期 2004.05.31
申请号 JP19960189813 申请日期 1996.07.18
申请人 发明人
分类号 B24B53/00;B24B53/017;B24B53/12;H01L21/304 主分类号 B24B53/00
代理机构 代理人
主权项
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