发明名称 GAS CONNECTION APPARATUS FOR PROCESSING SEMICONDUCTOR
摘要 PURPOSE: A gas connection apparatus for processing a semiconductor is provided to perform stably a purge gas process by inserting a purge gas line into a gas flow hole of a nozzle. CONSTITUTION: A gas connection apparatus for processing a semiconductor includes a connector, a purge gas line, and a reaction gas line. The connector(9) is coupled to a cylinder(3) of a reaction gas tank(1). A nozzle(7) is inserted into the connector. The purge gas line(11) is connected to a rear side of the nozzle. The reaction gas line(13) is formed vertically to a connection part between the rear side of the nozzle and a front side of the purge gas line. A gap is formed between an inner circumference of a gas flow hole(15) and an outer circumference of the purge gas line.
申请公布号 KR20040044788(A) 申请公布日期 2004.05.31
申请号 KR20020072964 申请日期 2002.11.22
申请人 SURIM CO., LTD. 发明人 CHA, SANG BANG
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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