发明名称 ELECTRO-CONDUCTIVE METAL PLATED POLYIMIDE SUBSTRATE COMPRISING POLYIMIDE MEMBRANE AND CONDUCTIVE METAL MEMBRANE
摘要 <p>PURPOSE: Provided is an electro-conductive metal plated polyimide substrate which has a lower metal layer having an alkali-resistance and a surface conductive metal layer having no etching solution-resistance. CONSTITUTION: The electro-conductive metal plated polyimide substrate comprises an aromatic polyimide substrate; a Mo-Ni alloy lower metal layer comprising Mo and Ni in a weight ratio of 75/25 to 99/1; and a plated conductive membrane. The Mo-Ni alloy lower metal layer comprises Mo and Ni in a weight ratio of 75/25 to 95/5. The conductive metal comprises copper. The aromatic polyimide substrate has a plasma treated surface and the surface comes in contact with the lower metal layer.</p>
申请公布号 KR20040044379(A) 申请公布日期 2004.05.28
申请号 KR20030082299 申请日期 2003.11.19
申请人 UBE INDUSTRIES, LTD. 发明人 KATSUKI SHOZO;MII HIDENORI
分类号 B32B7/02;H01L23/14;H01L23/498;H05K1/03;H05K3/38;(IPC1-7):B32B7/02 主分类号 B32B7/02
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