| 摘要 |
PROBLEM TO BE SOLVED: To provide a dielectric multilayer film manufacturing apparatus which realizes a direct monitoring method with many kinds of monitor wavelengths by performing film thickness control and is suitably mass-produced. SOLUTION: The dielectric multilayer film manufacturing apparatus equipped with a sputter cathode part 32 and a ion gun part 33 which are provided side by side opposite to a rotating substrate 34 is provide with: a fixed opening 47 which gives a gradient to the filming speed of a dielectric multilayer film formed on the rotating substrate, wherein the gradient is formed along the radius of the circle of substrate rotation; and a movable shutter 51 placed between the rotating substrate and sputter cathode part for correcting the film thickness of the formed dielectric multilayer film. Further, a DSP 41 is provided which measures the intensity of monitoring monochromatic light received with a photodetection part 38 after passing a plurality of monitor points 52 to 59 along the radius of the rotating substrate. The monitoring monochromatic light fluxes consisting at least of two wavelengths are arrayed in the increasing/decreasing order such that the wavelengths of the monochromatic light and the monitor point positions on the radius are made to correspond to each other and the light fluxes are made to pass the respective corresponding monitor points. Further, a computer 42 is provided which instructs the movement of the movable shutter 51 to move according to the light intensity variation measured with the DSP. COPYRIGHT: (C)2004,JPO
|
