| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a positive resist material, especially a chemically amplified positive resist material, having a high sensitivity, a high resolution, an exposure latitude, process adaptability which are superior to those of a conventional positive resist material, gives good-shaped pattern after exposure, and is small in, especially, line edge roughness, and is excellent in etching resistance. <P>SOLUTION: The polymer compound consists essentially of copolymerized repeating units represented by formula (1) or formula (2) and has a weight-average molecular weight in the range of 1,000 to 500,000. The positive resist material contains the polymer compound as a base resin. <P>COPYRIGHT: (C)2004,JPO |
