| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for precisely inspecting contaminations in an exposure mask having beams. <P>SOLUTION: The mask inspection apparatus is provided for detecting contaminations 8, 9 attached to a mask 1 having a film 4 for blocking charged particle beams, and having a portion with a predetermined pattern for allowing the charged particle beams to transmit therethrough. The apparatus comprises a light source 2, a photodetector 6 for detecting light that has been transmitted through the mask, and a signal processor 10 for determining spots, where the intensity of the detected transmitted light is below a predetermined value, as having been attached with contaminations. <P>COPYRIGHT: (C)2004,JPO</p> |
