发明名称 |
Holding apparatus, holding method, exposure apparatus and device manufacturing method |
摘要 |
A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a pore 70a connected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section 63, and a pore 70b connected to the suction apparatus 72 which draws out gas in the space between the lower face Ra of the reticle R and the second suction section 64. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.
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申请公布号 |
US2004100624(A1) |
申请公布日期 |
2004.05.27 |
申请号 |
US20030639651 |
申请日期 |
2003.08.13 |
申请人 |
NIKON CORPORATION |
发明人 |
HAGIWARA TSUNEYUKI;YOSHIMOTO HIROMITSU;HORIKAWA HIROTO;MIZUTANI HIDEO |
分类号 |
G03F7/20;H01L21/683;(IPC1-7):G03B27/58 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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