FABRICATION OF MAGNESIUM DIBORIDE SUPERCONDUCTOR THIN FILMS AND ELECTRONIC DEVICES BY ION IMPLANTATION

摘要

A process for the fabrication of superconducting magnesium diboride (MgB2) thin films and multiple layer structures is described. Single layer thin films are produced by boron ion implantation into a magnesium host, and the resulting film is annealed at 500 °C. Planar superconductor and non-superconductor interface structures can be produced by subsequential implantation steps using ion beams of different energies.