发明名称 |
TRAJECTORY PLANNING AND EXECUTION METHOD FOR A MOVABLE COMPONENT OF A LITHOGRAPHY SYSTEM, A SYSTEM AND A COMPUTER PROGRAM THEREOF |
摘要 |
PURPOSE: A trajectory planning and execution method for a movable component of a lithography system, a system and a computer program thereof are provided to plan and execute optimal projection for photolithography components during constant velocity scanning. CONSTITUTION: Initial control data(120) related to an start point, end point, distance and velocity of required scanning is received. An infinite jerk multi-axes trajectory(130) for the components is planned based on the initial control data(120). A profile execution operation is performed in real-time based on the planned infinite jerk multi-axes trajectory(130). Execution data including a position of the components as well as an acceleration is output to a control system. The component is a wafer stage or a reticle stage.
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申请公布号 |
KR20040044175(A) |
申请公布日期 |
2004.05.27 |
申请号 |
KR20030082661 |
申请日期 |
2003.11.20 |
申请人 |
ASML HOLDING N.V. |
发明人 |
GALBURT DANIEL N.;BEDNAREK TODD J. |
分类号 |
H01L21/027;G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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