发明名称 TRAJECTORY PLANNING AND EXECUTION METHOD FOR A MOVABLE COMPONENT OF A LITHOGRAPHY SYSTEM, A SYSTEM AND A COMPUTER PROGRAM THEREOF
摘要 PURPOSE: A trajectory planning and execution method for a movable component of a lithography system, a system and a computer program thereof are provided to plan and execute optimal projection for photolithography components during constant velocity scanning. CONSTITUTION: Initial control data(120) related to an start point, end point, distance and velocity of required scanning is received. An infinite jerk multi-axes trajectory(130) for the components is planned based on the initial control data(120). A profile execution operation is performed in real-time based on the planned infinite jerk multi-axes trajectory(130). Execution data including a position of the components as well as an acceleration is output to a control system. The component is a wafer stage or a reticle stage.
申请公布号 KR20040044175(A) 申请公布日期 2004.05.27
申请号 KR20030082661 申请日期 2003.11.20
申请人 ASML HOLDING N.V. 发明人 GALBURT DANIEL N.;BEDNAREK TODD J.
分类号 H01L21/027;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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