发明名称 |
VAPOR DEPOSITION APPARATUS, AND APPARATUS FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To improve the utilization ratio of an apparatus by juggling the maintenance of a vaporizing source and a vapor deposition treatment. SOLUTION: The vapor deposition apparatus comprises a main vacuum chamber 3 for accommodating a substrate (a glass substrate 1) of an object to be film-formed; several auxiliary vacuum chambers 3a and 3b arranged next to the main vacuum chamber 3 through gate valves 5a and 5b for opening and closing; and source migration mechanisms 6a and 6b for advancing or retreating a vaporizing source for film formation (a line type vaporizing source 2a and a line type vaporizing source 2b) between the auxiliary vacuum chambers 3a and 3b and the main vacuum chamber 3 when the gate valves 5a and 5b are opened, which are installed in each of the several auxiliary vacuum chambers 3a and 3b. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004149846(A) |
申请公布日期 |
2004.05.27 |
申请号 |
JP20020315765 |
申请日期 |
2002.10.30 |
申请人 |
SONY CORP |
发明人 |
KANO HIROSHI;MORI TAKAO;KAMIYAMA ISAO |
分类号 |
H05B33/12;C23C14/24;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):C23C14/24 |
主分类号 |
H05B33/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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