FLUORINATED SURFACTANTS FOR AQUEOUS ACID ETCH SOLUTIONS
摘要
<p>Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.</p>
申请公布号
WO2004044092(A1)
申请公布日期
2004.05.27
申请号
WO2003US29262
申请日期
2003.09.17
申请人
3M INNOVATIVE PROPERTIES COMPANY
发明人
PARENT, MICHAEL J.;SAVU, PATRICIA M.;FLYNN, RICHARD M.;ZHANG, ZHONGXING;LAMANNA, WILLIAM M.;QIU, ZAI-MING;MOORE, GEORGE, G., I.
