发明名称 PLATEN FOR CHEMICAL MECHANICAL POLISHING DEVICE, AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide an aluminum alloy platen for a CMP device keeping good affixed state of an abrasive pad even if used for a long term. <P>SOLUTION: The platen 18 comprises: a platen main body 32 made of aluminum alloy; an oxide film 34 formed on a surface in at least an area of the platen main body 32 to which the abrasive pad 20 is affixed, by anodizing; and fluorine resin films 36, 38 provided on a surface of the oxide film 34 in an abrasive pad affixing area. In this structure, the surface of the porous oxide film 34 is coated by the fluorine films 36, 38, thereby preventing contact between the oxide film 34 and abrasive liquid, preventing the corrosion of the platen main body 32, and keeping the affix state of the abrasive pad 20. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004148464(A) 申请公布日期 2004.05.27
申请号 JP20020318151 申请日期 2002.10.31
申请人 APPLIED MATERIALS INC 发明人 SAITO MASASHI
分类号 B24B37/12;H01L21/304 主分类号 B24B37/12
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