发明名称 COATING LIQUID FOR SEMICONDUCTOR FILM FORMATION, METHOD FOR MANUFACTURING SEMICONDUCTOR FILM USING SAME, AND SOLAR BATTERY OBTAINED BY USING SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide nonaqueous liquid which can maintain proper viscosity and form a semiconductor film with superior uniformity, adhesive strengths, porosity, and other properties after baking when a semiconductor film is formed on a transparent conductive substrate by a doctor blade method, a screen printing method, etc. <P>SOLUTION: The coating liquid for semiconductor film formation is prepared by mixing 30 to 2,000 mass pts. alkylene glycol, polyalkylene glycol, or alkyl ether thereof as a dispersant with 100 mass pts. metal oxide semiconductor powder. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004153030(A) 申请公布日期 2004.05.27
申请号 JP20020316885 申请日期 2002.10.30
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 BA ENREI;KIDA TETSUYA;ABE HIDEKAZU
分类号 H01L31/04;H01L21/208;H01L21/368;H01M14/00 主分类号 H01L31/04
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