| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a photo-radical polymerization initiator which does not remain in a coating film independently, has high heat resistance, has high sensitivity to a practical wavelength, generates no odor during the light exposure, has high stability and high shelf stability, can be synthesized under a comparatively mild condition and is high in productivity, a photosensitive resin composition containing the initiator and a product using them. <P>SOLUTION: The photo-radical polymerization initiator is composed of a compound (a) having in the molecule only one group containing a naphthalimide structure. The photosensitive resin composition comprises as an essential component the compound (a) and a compound (b) having an ethylenically unsaturated bond. The photosensitive resin composition is used as a forming material for a coating material or a printing ink, a color filter, an electronic component, an interlaminar insulation film, a wiring coating film, an optical member, an optical circuit, an optical circuit component, an antireflection film, a hologram or a building material. <P>COPYRIGHT: (C)2004,JPO |
