| 摘要 |
PROBLEM TO BE SOLVED: To prevent scratch marks from being caused to a substrate and treat the substrate with a high quality by correcting dislocation due to a posture change caused when transferring the substrate. SOLUTION: A laser displacement meter 51 detects that the posture change is caused to a secondary conveying mechanism 11, and the position of the secondary conveying mechanism 11 is adjusted by a correcting unit 43 according to the posture variation that is detected at the time of transferring a substrate W. Thus, the dislocation caused by the posture change can be corrected, and the positional relationship of a transfer between the secondary conveying mechanism 11 and a main conveying mechanism can be maintained normally. Consequently, scratch marks are prevented from being caused to the substrate W, and the substrate W can be treated with a high quality. COPYRIGHT: (C)2004,JPO |
