发明名称 ANALYZING MAGNET FOR ION IMPLANTATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an analyzing electromagnet for an ion implantation device formed into an air-core coil with sharply reduced weight and reduced cost, heightening the uniformity of a magnetic field on a beam orbit, sharply improving the freedom of layout at production line. SOLUTION: The air-core coil of which plane view is a fan-shaped racetrack shape is composed of a plurality of coils, and the plurality of coils are arranged in a vertical direction of the beam. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004152557(A) 申请公布日期 2004.05.27
申请号 JP20020315139 申请日期 2002.10.30
申请人 MITSUBISHI ELECTRIC CORP;ADVANCED DISPLAY INC 发明人 MATSUDA TETSUYA;YAMAMOTO SHUNJI;KO SANJU
分类号 H01J37/317;(IPC1-7):H01J37/317 主分类号 H01J37/317
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