发明名称 |
TFT ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A TFT(Thin Film Transistor) array substrate and manufacturing method thereof are provided to have a wide channel width by driving the respective unit pixels through two TFTs and minimize a stitch phenomenon. CONSTITUTION: A gate wiring including a conductive film made of aluminum, a gate line(121), a gate pad(125), and a gate electrode(123) is formed on the insulation substrate as a taper structure. A sustain electrode line(131) is formed on an upper portion of the substrate. The sustain electrode line(131) is superposed with a drain electrode(175) connected to a pixel electrode(190), thereby forming a sustain capacitor for increasing the charge preservation performance of a pixel. A gate electrode(123) is arranged with a horizontal direction and has the first and second gate electrodes(1231,1232) of the first and second TFTs(TFT1,TFT2). |
申请公布号 |
KR20040043864(A) |
申请公布日期 |
2004.05.27 |
申请号 |
KR20020072288 |
申请日期 |
2002.11.20 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAEK, SEUNG SU;KIM, DONG GYU;TAK, YEONG MI;YOON, JU AE |
分类号 |
G02F1/1368;G02F1/136;G09F9/30;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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